Monitoring nanoparticles down to 5nm in semiconductor equipment

September 06, 2018 // By Nick Flaherty
Innovative Nanotech, a member of Chroma Group in Taiwan, has introduced nanoparticles monitoring systems for semiconductor front-end processes.

The technology nodes of semiconductor have advanced to 10 nm and 7 nm at an extremely fast speed, and will be 5 nm or even 3 nm in the near future. However, the capabilities of the current particle monitoring technologies can barely monitor particles larger than 20 nm, which lag far behind the industry need. Innovative Nanotech has launched an in-line nanoparticle monitoring system, SuperSizer, to detect accurately and efficiently the size and distribution of nanoparticles less than 20 nm.

It can accurately and reliably distinguish particle sizes ranging from 5 nm to 1,000 nm with a concentration up to 1013 /cm 3, sorting by particle mobility in an electric field rather than optical separation. 

In the semiconductor industry, slurries and chemical solutions are delivered from chemical delivery system (CDS) to fabrication tools. From drums (or lorries) to the point of use, liquids will pass through numerous pipes, valves, pumps, and even the filters which may pollute the material. The SuperSizer tool constantly monitors the raw material drums, point of supply (POS), point of delivery (POD), point of entry (POE) and point of use (POU) to improve the control of the cleanliness of the solutions and further the fabrication yield.

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